OSU Extension to Hold Central Ohio Agronomy Day

November 26, 2007

NEWARK, Ohio -- Growing organic matter, managing foliar fungicides, enhancing soybean traits, and farming with precision technology are just some of the topics being covered during the Central Ohio Agronomy Day on Dec. 18.

The Ohio State University Extension-sponsored event will take place from 8:30 a.m. until 3:15 p.m. in Founders Hall at the Ohio State University/Central Ohio Technical College Newark campus. Registration is $25 before Dec. 14 and $30 at the door and includes refreshments, lunch, proceedings of presentations and 6.5 hours of continuing education units from certified crop advisors.

Additional registration options include adding $3 to the base fee to acquire 30 minutes of private pesticide applicator credits and adding $15 to the base fee to acquire 30 minutes of commercial pesticide applicator credits.

The event is tailored for progressive crop producers, the agronomy service industry, certified crop advisors and commercial pesticide applicators.

Topics of discussion during the event include growing organic matter and tilth in your soils; scenarios and possibilities for 2008 weather; enhanced quality soybean traits; fertilizer application accuracy; optimizing fertilizer costs; soil and water balance; precision farming with planter units and sprayer nozzles; foliar disease management in corn and soybeans; and weed resistance.

Event presenters include Jerry Hatfield, National Soil Tilth Lab in Ames, Iowa; Jim Noel, National Weather Service; Scott Shearer, professor of machine systems automation engineering at the University of Kentucky; Robert Mullen, Ohio State University soil fertility specialist; Dennis Mills, Ohio State University plant pathologist; and Mark Loux, Ohio State University weed specialist.

For more information or to register for the Central Ohio Agronomy Day, contact the OSU Extension Licking County office at (740) 670-5315, e-mail lick@postoffice.ag.ohio-state.edu, or log on to http://licking.osu.edu/agriculture.

Author(s): 
Candace Pollock
Source(s): 
Howard Siegrist